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<p>A precision digital edge-line-detection method is presented that was developed for extracting edge contours of resist lines of submicrometer width as imaged by scanning electron microscopy, as a means of inspection in integrated circuit fabrication. The method is based on a modification of the Hough transform.</p>
line extraction method; automated SEM inspection; VLSI resist; precision digital edge-line-detection method; edge contours; submicrometer width; scanning electron microscopy; integrated circuit fabrication; Hough transform; automatic testing; circuit analysis computing; computer vision; computerised picture processing; inspection; integrated circuit testing; scanning electron microscopy; transforms; VLSI
D.B. Shu, C.C. Li, J.F. Mancuso, Y.N. Sun, "A Line Extraction Method for Automated SEM Inspection of VLSI Resist", IEEE Transactions on Pattern Analysis & Machine Intelligence, vol. 10, no. , pp. 117-120, January 1988, doi:10.1109/34.3875
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