Issue No. 01 - January (1988 vol. 10)
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/34.3875
<p>A precision digital edge-line-detection method is presented that was developed for extracting edge contours of resist lines of submicrometer width as imaged by scanning electron microscopy, as a means of inspection in integrated circuit fabrication. The method is based on a modification of the Hough transform.</p>
line extraction method; automated SEM inspection; VLSI resist; precision digital edge-line-detection method; edge contours; submicrometer width; scanning electron microscopy; integrated circuit fabrication; Hough transform; automatic testing; circuit analysis computing; computer vision; computerised picture processing; inspection; integrated circuit testing; scanning electron microscopy; transforms; VLSI
C. Li, D. Shu, Y. Sun and J. Mancuso, "A Line Extraction Method for Automated SEM Inspection of VLSI Resist," in IEEE Transactions on Pattern Analysis & Machine Intelligence, vol. 10, no. , pp. 117-120, 1988.