The Community for Technology Leaders
1995 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers (1995)
Taipei, Taiwan
May 31, 1995 to June 2, 1995
ISSN: 1524-766X
ISBN: 0-7803-2773-X
TABLE OF CONTENTS

Process optimization for preventing boron-penetration using P or As co-implant in P-poly gate of P-MOSFETs (Abstract)

W.T. Sun , Dept. of Electr. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
S.H. Chen , Dept. of Electr. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
pp. 40,41,42,43
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