Proceedings 9th Workshop on Parallel and Distributed Simulation (ACM/IEEE) (1995)
Lake Placid, New York
June 14, 1995 to June 16, 1995
B.D. Lubachevsky , AT&T Bell Labs., Murray Hill, NJ, USA
V. Privman , AT&T Bell Labs., Murray Hill, NJ, USA
S.C. Roy , AT&T Bell Labs., Murray Hill, NJ, USA
We simulate ballistic particle deposition wherein a large number of spherical particles are "dropped" vertically over a planar horizontal surface. Upon first contact (with the surface or with a previously deposited particle) each particle stops. This model helps material scientists to study the adsorption and sediment formation. The model is sequential, with particles deposited one by one. We have found an equivalent formulation using a continuous time random process and we simulate the latter in parallel using a method similar to the one previously employed for simulating Ising spins. We augment the parallel algorithm for simulating Ising spins with several techniques aimed at the increase of efficiency of producing the particle configuration and statistics collection. We implement the resulting algorithm on a 16K PE MasPar MP-1 and a 4K PE MasPar MP-2. The parallel code runs on MasPar computers two orders of magnitude faster than an optimized sequential code runs on a fast workstation.
adsorption; physics computing; Ising model; parallel algorithms; digital simulation; sputter deposition; atom-surface impact; ultimate bead counter; massively parallel simulation; ballistic deposition; material scientists; adsorption; sediment formation; equivalent formulation; continuous time random process; Ising spins simulation; parallel algorithm; particle configuration; statistics collection; 16K PE MasPar MP-1; 4K PE MasPar MP-2
B. Lubachevsky, V. Privman and S. Roy, "The ultimate bead counter: efficient massively parallel simulation of ballistic deposition," Proceedings 9th Workshop on Parallel and Distributed Simulation (ACM/IEEE)(PADS), Lake Placid, New York, 1995, pp. 95.