Electronic Design, Test and Applications, IEEE International Workshop on (2010)
Ho Chi Minh City, Vietnam
Jan. 13, 2010 to Jan. 15, 2010
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/DELTA.2010.66
Reduction in integrated circuit (IC) half technology, which will no longer be sustainable by traditional fault isolation and failure analysis techniques. There is an urgent need for diagnostic software tools with (which manifest as clusters) observed from manufacturing defects can be traced back to a specific process, equipment or technology, a novel data mining algorithm defects from test data logs. This algorithm and provides accurate detection of 99%.
defects, clusters, segmentation, detection, data mining
W. J. Tee, L. Kleeman, C. Chan, M. P. Ooi, Y. C. Kuang and S. Demidenko, "Fast and Accurate Automatic Defect CLuster Extraction for Semiconductor Wafers," Electronic Design, Test and Applications, IEEE International Workshop on(DELTA), Ho Chi Minh City, Vietnam, 2010, pp. 276-280.