Computer Science and Information Engineering, World Congress on (2009)
Los Angeles, California USA
Mar. 31, 2009 to Apr. 2, 2009
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/CSIE.2009.583
Because the defects of the scalar quantity method for calculating 3D mask under off-axis illumination and the rigorous electromagnetic simulation method, basing on the vector Hopkins formula inferred past work, a model of adaptive Gaussian filter with scale adjustable is introduced，and new transmission cross coefficient contained parameters for lithography system is achieved. By using the arithmetic for analyzing transmission cross coefficient, it improved compute speed. As an example to TE wave, by simulating the aerial image of the three dimensional mask in actual lithography process, the inhibitor diffusion in photo resist is simulated, and the aerial image of the three dimensional mask in actual lithography process is also obtained.
P. f. Cao, L. Cheng and X. p. Zhang, "Computer Simulation of 3D Mask Image Based on Self-Adaptive Model in VLSI Lithography," 2009 WRI World Congress on Computer Science and Information Engineering, CSIE(CSIE), Los Angeles, CA, 2009, pp. 484-487.