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Proceedings IEEE Workshop on Applications of Computer Vision (1992)
Palm Springs, CA, USA
Nov. 30, 1992 to Dec. 2, 1992
ISBN: 0-8186-2840-5
pp: 266-273
B.H. Khalaj , Dept. of Electr. Eng., Stanford Univ., CA, USA
H.K. Aghajan , Dept. of Electr. Eng., Stanford Univ., CA, USA
T. Kailath , Dept. of Electr. Eng., Stanford Univ., CA, USA
ABSTRACT
A self-reference technique is developed for detecting the location of defects in repeated pattern wafers and masks. The application area of the proposed method includes inspection of memory chips, shift registers, switch capacitors, and CCD arrays. Using high resolution spectral estimation algorithms, the proposed technique first extracts the period and structure of repeated patterns from the image to sub-pixel resolution, and then produces a defect-free reference image for making comparison with the actual image. Since the technique acquires all its needed information from a single image, there is no need for a database image, a scaling procedure, or any a-priori knowledge about the repetition period of the patterns.<>
INDEX TERMS
automatic optical inspection, integrated circuit testing, monolithic integrated circuits
CITATION

B. Khalaj, H. Aghajan and T. Kailath, "Automated direct patterned wafer inspection," Proceedings IEEE Workshop on Applications of Computer Vision(ACV), Palm Springs, CA, USA, , pp. 266-273.
doi:10.1109/ACV.1992.240303
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