Issue No. 02 - March/April (2003 vol. 23)
Alfred K. Wong , University of Hong Kong
<p>With lithography parameters approaching their limits, continuous improvement requires increasing dialogues and compromises between the technology and design communities. Only with such communication can semiconductor manufacturers reach the 30-nm physical-gate-length era with optical lithography.</p>
A. K. Wong, "Microlithography: Trends, Challenges, Solutions, and Their Impact on Design," in IEEE Micro, vol. 23, no. , pp. 12-21, 2003.