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Issue No. 02 - March/April (2003 vol. 23)
ISSN: 0272-1732
pp: 12-21
Alfred K. Wong , University of Hong Kong
<p>With lithography parameters approaching their limits, continuous improvement requires increasing dialogues and compromises between the technology and design communities. Only with such communication can semiconductor manufacturers reach the 30-nm physical-gate-length era with optical lithography.</p>
Alfred K. Wong, "Microlithography: Trends, Challenges, Solutions, and Their Impact on Design", IEEE Micro, vol. 23, no. , pp. 12-21, March/April 2003, doi:10.1109/MM.2003.1196111
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