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ABSTRACT
As circuit feature size continues to shrink, we will soon need a failure analysis technique that provides resolutions of 10 nanometers or less. This feasibility study concludes that AFM technology, with reasonable improvements, can take over where focused ion beams leave off.
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CITATION

J. Lo, C. S. Johnson and W. D. Armitage, "Using Atomic Force Microscopy for Deep-Submicron Failure Analysis," in IEEE Design & Test of Computers, vol. 18, no. , pp. 10-18, 2001.
doi:10.1109/54.902818
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