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Computer Simulation of 3D Mask Image Based on Self-Adaptive Model in VLSI Lithography
Found in: Computer Science and Information Engineering, World Congress on
By Peng fei Cao, Lin Cheng, Xiao ping Zhang
Issue Date:April 2009
pp. 484-487
Because the defects of the scalar quantity method for calculating 3D mask under off-axis illumination and the rigorous electromagnetic simulation method, basing on the vector Hopkins formula inferred past work, a model of adaptive Gaussian filter with scal...