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26th IEEE VLSI Test Symposium (vts 2008)
A Metric for Assessing the Error Tolerance of Tile Sets for Punctured DNA Self-Assemblies
April 27-May 01
ISBN: 0-7695-3123-7
This paper presents a novel metric by which the effectiveness of punctures (as corrective action for error tolerance) can be assessed with respect to tile sets for DNA selfassembly in nano-manufacturing. Initially, the conditions for correct binding of a tile to an existing aggregate are analyzed using a Markovian approach; based on this analysis, it is proved that correct aggregation (as identified with a so-called Ideal Tile Set) is not always met for existing tile sets for nano-manufacturing. Hence, a metric is proposed for assessing tile sets by utilizing punctures. Tile sets are investigated and assessed with respect to features such error(mismatched tile) movement, punctured area and bondtypes. Subsequently, it is shown that the proposed metriccan comprehensively assess the effectiveness of a type of apuncture for a tile set and its capability to attain error tolerance for the desired pattern. Extensive simulation results are provided.
Index Terms:
Error Tolerance, Puncturing, DNA Self-Assembly
Citation:
Masoud Hashempour, Zahra Mashreghian Arani, Fabrizio Lombardi, "A Metric for Assessing the Error Tolerance of Tile Sets for Punctured DNA Self-Assemblies," vts, pp.275-282, 26th IEEE VLSI Test Symposium (vts 2008), 2008
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