22nd IEEE VLSI Test Symposium Multi-Modal Built-In Self-Test for Symmetric Microsystems Napa Valley, California April 25-April 29 ISBN: 0-7695-2134-7
A mathematical model analyzing the efficacy of a built-in self-test technique, applicable to any symmetrical MEMS microstructure, is developed. The model predicts that the BIST technique can also be used to characterize a wide range of local manufacturing variations affecting different regions of the device. Model predictions have been validated by simulation. Specifically, it has been shown that by using a suitable modulation scheme, sensitivity to linear etch variation along a particular direction is improved by nearly 30%.
Citation:
Nilmoni Deb, R. D. (Shawn) Blanton, "Multi-Modal Built-In Self-Test for Symmetric Microsystems," vts, pp.139, 22nd IEEE VLSI Test Symposium, 2004 Usage of this product signifies your acceptance of the Terms of Use. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||