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Fifth International Workshop on Microprocessor Test and Verification (MTV'04)
A Circuit Level Fault Model for Resistive Shorts of MOS Gate Oxide
Austin, Texas
September 09-September 10
ISBN: 0-7695-2320-X
Xiang Lu, Texas A&M University
Zhuo Li, Texas A&M University
Wangqi Qiu, Texas A&M University
D. M. H. Walker, Texas A&M University
Weiping Shi, Texas A&M University
Previous researchers in logic testing focused on shorts in MOS gate oxides that have zero-resistance. However, most shorts are resistive and may cause delay faults. In this paper, we propose a simple and realistic delay fault model for gate oxide shorts. A reasonably accurate method is proposed to compute delay change due to resistive shorts. We also enumerate all possible fault behaviors and present the relationship between input patterns and output behaviors, which is useful in ATPG.
Citation:
Xiang Lu, Zhuo Li, Wangqi Qiu, D. M. H. Walker, Weiping Shi, "A Circuit Level Fault Model for Resistive Shorts of MOS Gate Oxide," mtv, pp.97-102, Fifth International Workshop on Microprocessor Test and Verification (MTV'04), 2004
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