Replacing 6T SRAMs with 3T1D DRAMs in the L1 Data Cache to Combat Process Variability January/February 2008 (vol. 28 no. 1) pp. 60-68
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/MM.2008.12
With continued technology scaling, process variations will be especially detrimental to six-transistor static memory structures (6T SRAMs). A memory architecture using three-transistor, one-diode DRAM (3T1D) cells in the L1 data cache tolerates wide process variations with little performance degradation, making it a promising choice for on-chip cache structures for next-generation microprocessors. 1. W.K. Luk et al., "A 3-Transistor DRAM Cell with Gated Diode for Enhanced Speed and Retention Time," Proc. Symp. VLSI Circuits, IEEE Press, 2006, pp. 184-185.
Index Terms:
variability, process variation, caches, dynamic memory
Citation:
Xiaoyao Liang, Ramon Canal, Gu-Yeon Wei, David Brooks, "Replacing 6T SRAMs with 3T1D DRAMs in the L1 Data Cache to Combat Process Variability," IEEE Micro, vol. 28, no. 1, pp. 60-68, Jan./Feb. 2008, doi:10.1109/MM.2008.12 Usage of this product signifies your acceptance of the Terms of Use. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||