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Microlithography: Trends, Challenges, Solutions, and Their Impact on Design
March/April 2003 (vol. 23 no. 2)
pp. 12-21
ASCII Text
x 
 
Alfred K. Wong, "Microlithography: Trends, Challenges, Solutions, and Their Impact on Design," IEEE Micro, vol. 23, no. 2, pp. 12-21, March/April, 2003.
 
 
BibTex
x
 
@article{ 10.1109/MM.2003.1196111,
author = {Alfred K. Wong},
title = {Microlithography: Trends, Challenges, Solutions, and Their Impact on Design},
journal ={IEEE Micro},
volume = {23},
number = {2},
issn = {0272-1732},
year = {2003},
pages = {12-21},
doi = {http://doi.ieeecomputersociety.org/10.1109/MM.2003.1196111},
publisher = {IEEE Computer Society},
address = {Los Alamitos, CA, USA},
}
 
 
RefWorks Procite/RefMan/Endnote
x 
 
TY - MGZN
JO - IEEE Micro
TI - Microlithography: Trends, Challenges, Solutions, and Their Impact on Design
IS - 2
SN - 0272-1732
SP12
EP21
EPD - 12-21
A1 - Alfred K. Wong,
PY - 2003
VL - 23
JA - IEEE Micro
ER -
 
Alfred K. Wong, University of Hong Kong

With lithography parameters approaching their limits, continuous improvement requires increasing dialogues and compromises between the technology and design communities. Only with such communication can semiconductor manufacturers reach the 30-nm physical-gate-length era with optical lithography.

Citation:
Alfred K. Wong, "Microlithography: Trends, Challenges, Solutions, and Their Impact on Design," IEEE Micro, vol. 23, no. 2, pp. 12-21, Mar./Apr. 2003, doi:10.1109/MM.2003.1196111
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