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Logic Design for Printability Using OPC Methods
January/February 2006 (vol. 23 no. 1)
pp. 30-37
ASCII Text
x 
 
Kevin Lucas, Chi-Min Yuan, Robert Boone, Karl Wimmer, Kirk Strozewski, Olivier Toublan, "Logic Design for Printability Using OPC Methods," IEEE Design and Test of Computers, vol. 23, no. 1, pp. 30-37, January/February, 2006.
 
 
BibTex
x
 
@article{ 10.1109/MDT.2006.18,
author = {Kevin Lucas and Chi-Min Yuan and Robert Boone and Karl Wimmer and Kirk Strozewski and Olivier Toublan},
title = {Logic Design for Printability Using OPC Methods},
journal ={IEEE Design and Test of Computers},
volume = {23},
number = {1},
issn = {0740-7475},
year = {2006},
pages = {30-37},
doi = {http://doi.ieeecomputersociety.org/10.1109/MDT.2006.18},
publisher = {IEEE Computer Society},
address = {Los Alamitos, CA, USA},
}
 
 
RefWorks Procite/RefMan/Endnote
x 
 
TY - MGZN
JO - IEEE Design and Test of Computers
TI - Logic Design for Printability Using OPC Methods
IS - 1
SN - 0740-7475
SP30
EP37
EPD - 30-37
A1 - Kevin Lucas,
A1 - Chi-Min Yuan,
A1 - Robert Boone,
A1 - Karl Wimmer,
A1 - Kirk Strozewski,
A1 - Olivier Toublan,
PY - 2006
KW - optical proximity correction (OPC)
KW - reticle enhancement technology (RET)
KW - design for manufacturability (DFM)
VL - 23
JA - IEEE Design and Test of Computers
ER -
 
Kevin Lucas, Freescale Semiconductor
Chi-Min Yuan, Freescale Semiconductor
Robert Boone, Freescale Semiconductor
Karl Wimmer, Freescale Semiconductor
Kirk Strozewski, Freescale Semiconductor
Olivier Toublan, Mentor Graphics Europe
Editor's note: This article provides an intriguing analysis of traditional DFM techniques and describes methods of extending them into post-tapeout optimization in the form of OPC or RET design for printability. Layouts are altered so that lithographic patterning control improves. A highlight of the article is its subsequent analysis of the implementation feasibility of actual product designs.
--Juan-Antonio Carballo, IBM Corporate Strategy, Venture Capital Group
Index Terms:
optical proximity correction (OPC), reticle enhancement technology (RET), design for manufacturability (DFM)
Citation:
Kevin Lucas, Chi-Min Yuan, Robert Boone, Karl Wimmer, Kirk Strozewski, Olivier Toublan, "Logic Design for Printability Using OPC Methods," IEEE Design and Test of Computers, vol. 23, no. 1, pp. 30-37, Jan./Feb. 2006, doi:10.1109/MDT.2006.18
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