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Fifth International Workshop on System-on-Chip for Real-Time Applications (IWSOC'05)
Strained Si and the Future Direction of CMOS, invited
Banff, Alberta, Canada
July 20-July 24
ISBN: 0-7695-2403-6
ASCII Text
x 
 
Scott E. Thompson, "Strained Si and the Future Direction of CMOS, invited," System-on-Chip for Real-Time Applications, International Workshop on, pp. 14-16, Fifth International Workshop on System-on-Chip for Real-Time Applications (IWSOC'05), 2005.
 
 
BibTex
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@article{ 10.1109/IWSOC.2005.99,
author = {Scott E. Thompson},
title = {Strained Si and the Future Direction of CMOS, invited},
journal ={System-on-Chip for Real-Time Applications, International Workshop on},
volume = {0},
year = {2005},
isbn = {0-7695-2403-6},
pages = {14-16},
doi = {http://doi.ieeecomputersociety.org/10.1109/IWSOC.2005.99},
publisher = {IEEE Computer Society},
address = {Los Alamitos, CA, USA},
}
 
 
RefWorks Procite/RefMan/Endnote
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TY - CONF
JO - System-on-Chip for Real-Time Applications, International Workshop on
TI - Strained Si and the Future Direction of CMOS, invited
SN - 0-7695-2403-6
SP14
EP16
A1 - Scott E. Thompson,
PY - 2005
KW - null
VL - 0
JA - System-on-Chip for Real-Time Applications, International Workshop on
ER -
 
Scott E. Thompson, University of Florida
Uniaxial process induced strain is being adopted in all 90, 65, and 45 nm high performance logic technologies. Uniaxial strain offers large performance improvement at low cost and minimally increased manufacturing complexity and is scalable to future technology nodes.
Citation:
Scott E. Thompson, "Strained Si and the Future Direction of CMOS, invited," iwsoc, pp.14-16, Fifth International Workshop on System-on-Chip for Real-Time Applications (IWSOC'05), 2005
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