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International Test Conference 2004 (ITC'04)
Charlotte, NC, USA
October 26-October 28
ISBN: 0-7803-8581-0
ASCII Text
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Greg Aldrich, "100 DPPM in Nanometer Technology... Is it achievable?," Test Conference, International, pp. 1417, International Test Conference 2004 (ITC'04), 2004.
 
 
BibTex
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@article{ 10.1109/ITC.2004.2,
author = {Greg Aldrich},
title = {100 DPPM in Nanometer Technology... Is it achievable?},
journal ={Test Conference, International},
volume = {0},
year = {2004},
issn = {1089-3539},
pages = {1417},
doi = {http://doi.ieeecomputersociety.org/10.1109/ITC.2004.2},
publisher = {IEEE Computer Society},
address = {Los Alamitos, CA, USA},
}
 
 
RefWorks Procite/RefMan/Endnote
x 
 
TY - CONF
JO - Test Conference, International
TI - 100 DPPM in Nanometer Technology... Is it achievable?
SN - 1089-3539
SP
EP
A1 - Greg Aldrich,
PY - 2004
KW - null
VL - 0
JA - Test Conference, International
ER -
 
Greg Aldrich, Mentor Graphics Corporation
As process technologies move to 100nm and below, maintaining acceptable defect levels has become more difficult. This panel assembles a group of experts in the area of manufacturing and test for an open discussion on the challenges and solutions available for achieving 100 defective parts per million (DPPM) or better with nanometer design technologies.
Citation:
Greg Aldrich, "100 DPPM in Nanometer Technology... Is it achievable?," itc, pp.1417, International Test Conference 2004 (ITC'04), 2004
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