The gate oxide thickness in sub-70nm process technologies approaches the limit where direct gate tunneling current starts to play a significant role in both off-state and on-state transistors. In this paper, we present a novel Reduced-Gate SRAM (RG-SRAM) that uses two additional PMOS pass transistors to decrease the gate leakage dissipation in Very Deep Sub-Micron (VDSM) cache and embedded memories.
Citation:
Charan Thondapu, Praveen Elakkumanan, Ramalingam Sridhar, "RG-SRAM: A Low Gate Leakage Memory Design," isvlsi, pp.295-296, IEEE Computer Society Annual Symposium on VLSI: New Frontiers in VLSI Design (ISVLSI'05), 2005