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IEEE Computer Society Annual Symposium on VLSI: New Frontiers in VLSI Design (ISVLSI'05)
Tampa, Florida
May 11-May 12
ISBN: 0-7695-2365-X
Charan Thondapu, State University of New York at Buffalo
Praveen Elakkumanan, State University of New York at Buffalo
Ramalingam Sridhar, State University of New York at Buffalo
The gate oxide thickness in sub-70nm process technologies approaches the limit where direct gate tunneling current starts to play a significant role in both off-state and on-state transistors. In this paper, we present a novel Reduced-Gate SRAM (RG-SRAM) that uses two additional PMOS pass transistors to decrease the gate leakage dissipation in Very Deep Sub-Micron (VDSM) cache and embedded memories.
Citation:
Charan Thondapu, Praveen Elakkumanan, Ramalingam Sridhar, "RG-SRAM: A Low Gate Leakage Memory Design," isvlsi, pp.295-296, IEEE Computer Society Annual Symposium on VLSI: New Frontiers in VLSI Design (ISVLSI'05), 2005
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