Quality of EDA CAD Tools: Definitions, Metrics and Directions

I
ISQED
2000
First International Symposium on Quality of Electronic Design
Abstract - Quality of EDA CAD Tools: Definitions, Metrics and Directions

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	Similar Articles Articles by A.H. Farrahi Articles by D.J. Hathaway Articles by M. Wang Articles by M. Sarrafzadeh

First International Symposium on Quality of Electronic Design

San Jose, California

March 20-March 22

ISBN: 0-7695-0525-2

	ASCII Text	x
	A.H. Farrahi, D.J. Hathaway, M. Wang, M. Sarrafzadeh, "Quality of EDA CAD Tools: Definitions, Metrics and Directions," Quality Electronic Design, International Symposium on, pp. 395, First International Symposium on Quality of Electronic Design, 2000.

	BibTex	x
	@article{ 10.1109/ISQED.2000.838903, author = {A.H. Farrahi and D.J. Hathaway and M. Wang and M. Sarrafzadeh}, title = {Quality of EDA CAD Tools: Definitions, Metrics and Directions}, journal ={Quality Electronic Design, International Symposium on}, volume = {0}, year = {2000}, isbn = {0-7695-0525-2}, pages = {395}, doi = {http://doi.ieeecomputersociety.org/10.1109/ISQED.2000.838903}, publisher = {IEEE Computer Society}, address = {Los Alamitos, CA, USA}, }

	RefWorks Procite/RefMan/Endnote	x
	TY - CONF JO - Quality Electronic Design, International Symposium on TI - Quality of EDA CAD Tools: Definitions, Metrics and Directions SN - 0-7695-0525-2 SP EP A1 - A.H. Farrahi, A1 - D.J. Hathaway, A1 - M. Wang, A1 - M. Sarrafzadeh, PY - 2000 KW - Design Quality Metrics KW - Integrated Design Exploration KW - Incremental Synthesis KW - Layout-Driven Synthesis' System-Level Interconnect Prediction and Planning KW - Deep Submicron Designs KW - Tool Interoperability VL - 0 JA - Quality Electronic Design, International Symposium on ER -

A.H. Farrahi, IBM T.J. Watson Research Center

D.J. Hathaway, IBM Electronic Design Automation

M. Wang, Northwestern University

M. Sarrafzadeh, Northwestern University

DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/ISQED.2000.838903

In this paper we survey major problems faced by EDA tools in tackling submicron (DSM) design challenges like: crosstalk, reliability, power, and interconnect dominated delay. We discuss the need for rethinking quality models used in EDA tools to allow early and reliable planning, estimation, analysis, and optimization. Key design quality metrics from a CAD tool perspective are surveyed, and methodologies and directions are proposed for the next generation design automation tools, intended to meet the challenges ahead. Ideas such as forward synthesis, incremental synthesis, system-level interconnect prediction and planning, and their implications on design quality, design tool architecture, and design methodology are explored.

Index Terms:

Design Quality Metrics, Integrated Design Exploration, Incremental Synthesis, Layout-Driven Synthesis' System-Level Interconnect Prediction and Planning, Deep Submicron Designs, Tool Interoperability

Citation:

A.H. Farrahi, D.J. Hathaway, M. Wang, M. Sarrafzadeh, "Quality of EDA CAD Tools: Definitions, Metrics and Directions," isqed, pp.395, First International Symposium on Quality of Electronic Design, 2000

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