loading...
 This Article 
   
 Share 
   
 Bibliographic References 
   
 Add to: 
 
Digg
Furl
Spurl
Blink
Simpy
Google
Del.icio.us
Y!MyWeb
 
 Search 
   
The 14th International Conference on VLSI Design (VLSID '01)
High Frequency Behaviour Of Electron Transport In Silicon And Its Implication For Drain Conductance Of Mos Transistors
Bangalore, India
January 03-January 07
ISBN: 0-7695-0831-6
B. Prasad, Kurukshetra University
P.J. George, Kurukshetra University
Drain conductance gd is an important small signal parameter of the MOS Transistor. Very small values of drain conductance are crucial to realizing high-gain amplifiers. This paper studies high frequency small signal behaviour of electron transport in Silicon under biasing electric fields that are typical of MOS channels in the saturation region using Monte Carlo Technique. It is found that the small signal mobility, which is very small at low frequencies, becomes large at high frequencies of the order of 1012-1013Hz. This behaviour indicates that in those MOS devices where velocity saturation is the cause of drain current saturation the drain conductance at high frequencies will become large. This will substantially reduce amplifier gains at these frequencies.
Citation:
B. Prasad, P.J. George, Chandra Shekhar, "High Frequency Behaviour Of Electron Transport In Silicon And Its Implication For Drain Conductance Of Mos Transistors," vlsid, pp.491, The 14th International Conference on VLSI Design (VLSID '01), 2001
Usage of this product signifies your acceptance of the Terms of Use.