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18th International Conference on Pattern Recognition (ICPR'06) Volume 3
Minimum Enclosing and Maximum Excluding Machine for Pattern Description and Discrimination
Hong Kong
August 20-August 24
ISBN: 0-7695-2521-0
Yi Liu, Ohio State University, Columbus, Ohio
Yuan F. Zheng, Ohio State University, Columbus, Ohio
This work addresses the description problem of a target class in the presence of negative samples or outliers. Traditional Support Vector Machines (SVM) has strong discrimination capability to distinguish the target class but does not reject the uncharacteristic patterns well. The one-class SVM, on the other hand, provides good representation for the class of interest but overlooks the discrimination issue between the class and outliers. This paper presents a new one-class classifier named minimum enclosing and maximum excluding machine (MEMEM), which offers capabilities for both pattern description and discrimination. The properties of MEMEM are analyzed and the performance comparisons using synthetic and real data are presented.
Citation:
Yi Liu, Yuan F. Zheng, "Minimum Enclosing and Maximum Excluding Machine for Pattern Description and Discrimination," icpr, vol. 3, pp.129-132, 18th International Conference on Pattern Recognition (ICPR'06) Volume 3, 2006
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