20th IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems (DFT'05) Soft Errors induced by single heavy ions in Floating Gate memory arrays Monterey, California October 03-October 05 ISBN: 0-7695-2464-8
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/DFTVS.2005.62
Single, high-energy ions can induce large charge loss from Floating Gates used as basic storage elements in nonvolatile memory cells. The charge loss greatly exceeds that calculated by using conventional models based on generation and recombination of charge. Further, the ion locally damages the tunnel oxide, leading to degradation of retention properties of the Floating Gate over long times. This mechanism has important implications to design fault tolerant Floating Gate memories which should be operated in radiation harsh environment.
Citation:
G. Cellere, A. Paccagnella, A. Visconti, M. Bonanomi, "Soft Errors induced by single heavy ions in Floating Gate memory arrays," dft, pp.275-284, 20th IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems (DFT'05), 2005 Usage of this product signifies your acceptance of the Terms of Use. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||