21st IEEE International Symposium on Defect and Fault-Tolerance in VLSI Systems (DFT'06) Error Tolerance of DNA Self-Assembly by Monomer Concentration Control Arlington, Virginia, USA October 04-October 06 ISBN: 0-7695-2706-X
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/DFT.2006.29
This paper proposes the control of monomer concentration as a novel improvement of the kinetic Tile Assembly Model (kTAM) to reduce the error rate in DNA self-assembly. Tolerance to errors in this process is very important for manufacturing highly dense ICs; the proposed technique significantly decreases error rates (i.e. it increases error tolerance) by controlling the concentration of monomers. A stochastic analysis based on a new state model is presented. Error rates reductions of at least 10% are found by evaluating the proposed scheme comparing to a scheme with constant concentration. One of the significant advantages of the proposed scheme is that it doesn?t entail an overhead such as increase in size and a slow growth, while still achieving a significant reduction in error rate.
Citation:
Byunghyun Jang, Yong-Bin Kim, Fabrizio Lombardi, "Error Tolerance of DNA Self-Assembly by Monomer Concentration Control," dft, pp.89-97, 21st IEEE International Symposium on Defect and Fault-Tolerance in VLSI Systems (DFT'06), 2006 Usage of this product signifies your acceptance of the Terms of Use. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||