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Design, Automation and Test in Europe (DATE'05) Volume 1
Munich, Germany
March 07-March 11
ISBN: 0-7695-2288-2
L. Lopez, L2MP-Polytech-UMR CNRS, France; ST-Microelectronics, France
J. M. Portal, L2MP-Polytech-UMR CNRS, France
D. N?, ST-Microelectronics, France
The embedded DRAM (eDRAM) is more and more used in System On Chip (SOC). The integration of the DRAM capacitor process into a logic process is challenging to get satisfactory yields. The specific process of DRAM capacitor and the low capacitance value (~30F) of this device induce problems of process monitoring and failure analysis. We propose a new test structure to measure the capacitance value of each DRAM cell capacitor in a DRAM array. This concept has been validated by simulation on a 0.18μm eDRAM technology.
Citation:
L. Lopez, J. M. Portal, D. N?, "A New Embedded Measurement Structure for eDRAM Capacitor," date, vol. 1, pp.462-463, Design, Automation and Test in Europe (DATE'05) Volume 1, 2005
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