Design-Manufacturing Interface: Part II

D
DATE
1998
Design Automation and Test in Europe (DATE '98)
Abstract - Design-Manufacturing Interface: Part II - Applications

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Design Automation and Test in Europe (DATE '98)

Design-Manufacturing Interface: Part II - Applications

Paris, France

February 23-February 26

ISBN: 0-8186-8359-7

	ASCII Text	x
	W. Maly, P.K. Nag, C. Ouyang, H.T. Heineken, J. Khare, P. Simon, "Design-Manufacturing Interface: Part II - Applications," Design, Automation and Test in Europe Conference and Exhibition, pp. 557, Design Automation and Test in Europe (DATE '98), 1998.

	BibTex	x
	@article{ 10.1109/DATE.1998.655913, author = {W. Maly and P.K. Nag and C. Ouyang and H.T. Heineken and J. Khare and P. Simon}, title = {Design-Manufacturing Interface: Part II - Applications}, journal ={Design, Automation and Test in Europe Conference and Exhibition}, volume = {0}, year = {1998}, isbn = {0-8186-8359-7}, pages = {557}, doi = {http://doi.ieeecomputersociety.org/10.1109/DATE.1998.655913}, publisher = {IEEE Computer Society}, address = {Los Alamitos, CA, USA}, }

	RefWorks Procite/RefMan/Endnote	x
	TY - CONF JO - Design, Automation and Test in Europe Conference and Exhibition TI - Design-Manufacturing Interface: Part II - Applications SN - 0-8186-8359-7 SP EP A1 - W. Maly, A1 - P.K. Nag, A1 - C. Ouyang, A1 - H.T. Heineken, A1 - J. Khare, A1 - P. Simon, PY - 1998 KW - manufacturability KW - yield KW - critical area KW - metal utilization KW - etch rate variation KW - antenna effect VL - 0 JA - Design, Automation and Test in Europe Conference and Exhibition ER -

W. Maly, Carnegie Mellon University

P.K. Nag, Carnegie Mellon University

C. Ouyang, Carnegie Mellon University

H.T. Heineken, Level One Communications

J. Khare, Level One Communications

P. Simon, Philips NV, Nijmegen, The Netherlands

DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/DATE.1998.655913

This paper illustrates via examples problems at the design-manufacturing interface that exist in the IC industry today, and the ability of the YAN/PODEMA framework in solving these problems. The need for further development of the framework is also emphasized.

Index Terms:

manufacturability, yield, critical area, metal utilization, etch rate variation, antenna effect

Citation:

W. Maly, P.K. Nag, C. Ouyang, H.T. Heineken, J. Khare, P. Simon, "Design-Manufacturing Interface: Part II - Applications," date, pp.557, Design Automation and Test in Europe (DATE '98), 1998

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