2001 IEEE Computer Society Conference on Computer Vision and Pattern Recognition (CVPR'01) - Volume 2
Eliminating Ghosting and Exposure Artifacts in Image Mosaics
Kauai, Hawaii
December 08-December 14
ISBN: 0-7695-1272-0
As panoramic photography becomes increasingly popular, there is a greater need for high-quality software to automatically create panoramic images. Existing algorithms either produce a rough "stitch" that cannot deal with common artifacts, or require user input. This paper presents methods for dealing with two artifacts that often occur in practice. Our first contribution is a method for dealing with objects that move between different views of a dynamic scene. If such moving objects are left in, they will appear blurry and "ghosted". Treating such regions as nodes in a graph, we use a vertex cover algorithm to selectively remove all but one instance of each object. Our second contribution is a method for continuously adjusting exposure across multiple images in order to eliminate visible shifts in brightness or hue. We compute exposure corrections on a block-by block basis, then smoothly interpolate the parameters using a spline to get spatially continuous exposure adjustment. Our enhancements, combined with previously published techniques for automatic image stitching, result in a high-quality automated stitcher that exhibits far fewer artifacts than existing software.
Citation:
Matthew Uyttendaele, Ashley Eden, Richard Szeliski, "Eliminating Ghosting and Exposure Artifacts in Image Mosaics," cvpr, vol. 2, pp.509, 2001 IEEE Computer Society Conference on Computer Vision and Pattern Recognition (CVPR'01) - Volume 2, 2001