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7th IEEE International Conference on Computer and Information Technology (CIT 2007)
Adaptive Optical Proximity Correction Using an Optimization Method
Aizu-Wakamatsu City, Fukushima, Japan
October 16-October 19
ISBN: 0-7695-2983-6
ASCII Text
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Tetsuaki Matsunawa, Hirokazu Nosato, Hidenori Sakanashi, Masahiro Murakawa, Eiichi Takahashi, Tsuneo Terasawa, Toshihiko Tanaka, Osamu Suga, Tetsuya Higuchi, "Adaptive Optical Proximity Correction Using an Optimization Method," Computer and Information Technology, International Conference on, pp. 853-860, 7th IEEE International Conference on Computer and Information Technology (CIT 2007), 2007.
 
 
BibTex
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@article{ 10.1109/CIT.2007.133,
author = {Tetsuaki Matsunawa and Hirokazu Nosato and Hidenori Sakanashi and Masahiro Murakawa and Eiichi Takahashi and Tsuneo Terasawa and Toshihiko Tanaka and Osamu Suga and Tetsuya Higuchi},
title = {Adaptive Optical Proximity Correction Using an Optimization Method},
journal ={Computer and Information Technology, International Conference on},
volume = {0},
year = {2007},
isbn = {0-7695-2983-6},
pages = {853-860},
doi = {http://doi.ieeecomputersociety.org/10.1109/CIT.2007.133},
publisher = {IEEE Computer Society},
address = {Los Alamitos, CA, USA},
}
 
 
RefWorks Procite/RefMan/Endnote
x 
 
TY - CONF
JO - Computer and Information Technology, International Conference on
TI - Adaptive Optical Proximity Correction Using an Optimization Method
SN - 0-7695-2983-6
SP853
EP860
A1 - Tetsuaki Matsunawa,
A1 - Hirokazu Nosato,
A1 - Hidenori Sakanashi,
A1 - Masahiro Murakawa,
A1 - Eiichi Takahashi,
A1 - Tsuneo Terasawa,
A1 - Toshihiko Tanaka,
A1 - Osamu Suga,
A1 - Tetsuya Higuchi,
PY - 2007
VL - 0
JA - Computer and Information Technology, International Conference on
ER -
 
Tetsuaki Matsunawa, 1University of Tsukuba
Hirokazu Nosato, AIST, Umezono, Tsukuba, Ibaraki, Japan
Hidenori Sakanashi, AIST, Umezono, Tsukuba, Ibaraki, Japan
Masahiro Murakawa, AIST, Umezono, Tsukuba, Ibaraki, Japan
Eiichi Takahashi, AIST, Umezono, Tsukuba, Ibaraki, Japan
Tsuneo Terasawa, Semiconductor Leading Edge Technologies, Inc. 16-1 Onogawa, Tsukuba, Ibaraki, Japan
Toshihiko Tanaka, Semiconductor Leading Edge Technologies, Inc. 16-1 Onogawa, Tsukuba, Ibaraki, Japan
Osamu Suga, Semiconductor Leading Edge Technologies, Inc. 16-1 Onogawa, Tsukuba, Ibaraki, Japan
Tetsuya Higuchi, AIST, Japan
This paper proposes a new approach to the optical prox- imity correction (OPC) method which reduces OPC calcu- lation loads by employing an optimization method. OPC is a method of correcting for a mask pattern to improve the fidelity of an image pattern on a silicon wafer. How- ever, conventional OPC calculations have become increas- ingly complex as the size of semiconductor devices becomes even smaller. In order to overcome this problem, we pro- pose an adaptive OPC technology using an optimization method to realize OPC for the full-chip area at fast opera- tional speeds. The effectiveness of this approach in terms of reduced OPC calculation times and highly-accurate correc- tion is demonstrated through computational experiments.
Citation:
Tetsuaki Matsunawa, Hirokazu Nosato, Hidenori Sakanashi, Masahiro Murakawa, Eiichi Takahashi, Tsuneo Terasawa, Toshihiko Tanaka, Osamu Suga, Tetsuya Higuchi, "Adaptive Optical Proximity Correction Using an Optimization Method," cit, pp.853-860, 7th IEEE International Conference on Computer and Information Technology (CIT 2007), 2007
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