Predictive Process Simulation and Stress-Mediated Diffusion in Silicon July/August 2001 (vol. 3 no. 4) pp. 92-95
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/5992.931909
Citation:
Wolfgang Windl, Matthew Laudon, Neil N. Carlson, Murray S. Daw, "Predictive Process Simulation and Stress-Mediated Diffusion in Silicon," Computing in Science and Engineering, vol. 3, no. 4, pp. 92-95, July/Aug. 2001, doi:10.1109/5992.931909 Usage of this product signifies your acceptance of the Terms of Use. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||