Image Processing Techniques for Wafer Defect Cluster Identification March/April 2002 (vol. 19 no. 2) pp. 44-48
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/54.990441
An automatic, wafer-scale, defect cluster identifier finds and marks all defective dies, further automating wafer testing. A prototype tool screens 45,000 wafers, saving a Philips Semiconductor test facility $100,000 in expenses per month.
Citation:
Chenn-Jung Huang, Chua-Chin Wang, Chi-Feng Wu, "Image Processing Techniques for Wafer Defect Cluster Identification," IEEE Design and Test of Computers, vol. 19, no. 2, pp. 44-48, Mar./Apr. 2002, doi:10.1109/54.990441 Usage of this product signifies your acceptance of the Terms of Use. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||