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22nd IEEE VLSI Test Symposium
Multi-Modal Built-In Self-Test for Symmetric Microsystems
Napa Valley, California
April 25-April 29
ISBN: 0-7695-2134-7
ASCII Text
x 
 
Nilmoni Deb, R. D. (Shawn) Blanton, "Multi-Modal Built-In Self-Test for Symmetric Microsystems," VLSI Test Symposium, IEEE, pp. 139, 22nd IEEE VLSI Test Symposium, 2004.
 
 
BibTex
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@article{ 10.1109/VTEST.2004.1299237,
author = {Nilmoni Deb and R. D. (Shawn) Blanton},
title = {Multi-Modal Built-In Self-Test for Symmetric Microsystems},
journal ={VLSI Test Symposium, IEEE},
volume = {0},
year = {2004},
issn = {1093-0167},
pages = {139},
doi = {http://doi.ieeecomputersociety.org/10.1109/VTEST.2004.1299237},
publisher = {IEEE Computer Society},
address = {Los Alamitos, CA, USA},
}
 
 
RefWorks Procite/RefMan/Endnote
x 
 
TY - CONF
JO - VLSI Test Symposium, IEEE
TI - Multi-Modal Built-In Self-Test for Symmetric Microsystems
SN - 1093-0167
SP
EP
A1 - Nilmoni Deb,
A1 - R. D. (Shawn) Blanton,
PY - 2004
KW - null
VL - 0
JA - VLSI Test Symposium, IEEE
ER -
 
Nilmoni Deb, Carnegie Mellon University, Pittsburgh, PA
R. D. (Shawn) Blanton, Carnegie Mellon University, Pittsburgh, PA
A mathematical model analyzing the efficacy of a built-in self-test technique, applicable to any symmetrical MEMS microstructure, is developed. The model predicts that the BIST technique can also be used to characterize a wide range of local manufacturing variations affecting different regions of the device. Model predictions have been validated by simulation. Specifically, it has been shown that by using a suitable modulation scheme, sensitivity to linear etch variation along a particular direction is improved by nearly 30%.
Citation:
Nilmoni Deb, R. D. (Shawn) Blanton, "Multi-Modal Built-In Self-Test for Symmetric Microsystems," vts, pp.139, 22nd IEEE VLSI Test Symposium, 2004
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