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ASP-DAC/VLSI Design 2002
Impact of Technology Scaling on Metastability Performance of CMOS Synchronizing Latches
Bangalore, India
January 07-January 11
ISBN: 0-7695-1441-3
Maryam Shojaei Baghini, MicroElectronics Group
Madhav P. Desai, MicroElectronics Group
In this paper, we use circuit simulations to characterize the effects of technology scaling on the metastability parameters of CMOS latches used as synchronizers. We perform this characterization by obtaining a synchronization error probability curve from a histogram of the latch delay. The main metastability parameters of CMOS latches are Tm and Tw. Tm is the exponential time constant of the rate of decay of metastability and Tw is effective size of metastability window at a normal propagation delay. Both parameters can be extracted from a histogram of the latch delay. This paper also explains a way to calibrate simulator for enough accuracy. Our simulations indicate that Tm scales better than the technology scale factor. Tw also scales down but its factor cannot be well estimated as that of Tm. This is because Tw is a complex function of signal and clock edge rate and logic threshold level.
Index Terms:
Metastability, Technology Scaling, CMOS latches
Citation:
Maryam Shojaei Baghini, Madhav P. Desai, "Impact of Technology Scaling on Metastability Performance of CMOS Synchronizing Latches," vlsid, pp.317, ASP-DAC/VLSI Design 2002, 2002
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