30th Annual Simulation Symposium (SS '97) Simulation of equipment design optimisation in microelectronics manufacturing Atlanta, GA April 07-April 09 ISBN: 0-8186-7934-4
We explore different mathematical formulations, develop an object oriented simulation environment, and perform a parametric study in the design of a high yield low cost (raw material), and short cycle time chemical vapor deposition (CVD) reactor for microelectronic manufacturing. We begin with several possible configurations for the reactor and formulate them into their corresponding numerical optimization problems. We then develop a software architecture for solving the optimization problems by integrating the heat conduction and species transport simulation codes and a modern optimization software into an object oriented optimization environment. Numerical experiments are performed, reported and discussed.
Index Terms:
integrated circuit manufacture; equipment design optimisation simulation; microelectronics manufacturing; mathematical formulations; object oriented simulation environment; parametric study; short cycle time chemical vapor deposition reactor; numerical optimization problems; software architecture; optimization problems; heat conduction; species transport simulation codes; modern optimization software; object oriented optimization environment
Citation:
C.H. Tong, J.C. Meza, C.D. Moen, "Simulation of equipment design optimisation in microelectronics manufacturing," ss, pp.92, 30th Annual Simulation Symposium (SS '97), 1997 Usage of this product signifies your acceptance of the Terms of Use. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||