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17th International Conference on Pattern Recognition (ICPR'04) - Volume 2
Using Adapted Levenshtein Distance for On-Line Signature Authentication
Cambridge UK
August 23-August 26
ISBN: 0-7695-2128-2
Sascha Schimke, Otto-von-Guericke University Magdeburg, Germany
Claus Vielhauer, Otto-von-Guericke University Magdeburg, Germany
Jana Dittmann, Otto-von-Guericke University Magdeburg, Germany
In this paper a new method for on-line signature authentication will be presented, which is based on a event-string modelling of features derived from pen-position and pressure signals of digitizer tablets. A distance measure well known from textual pattern recognition, the Levenshtein Distance, is used for comparison of signatures and classification is carried out applying a nearest neighbor classifier. Results from a test set of 1376 signatures from 41 persons are presented, which have been conducted for four different feature sets. The results are rather encouraging, with correct identification rates of 96% at zero false classifications.
Citation:
Sascha Schimke, Claus Vielhauer, Jana Dittmann, "Using Adapted Levenshtein Distance for On-Line Signature Authentication," icpr, vol. 2, pp.931-934, 17th International Conference on Pattern Recognition (ICPR'04) - Volume 2, 2004
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