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A Line Extraction Method for Automated SEM Inspection of VLSI Resist
January 1988 (vol. 10 no. 1)
pp. 117-120

A precision digital edge-line-detection method is presented that was developed for extracting edge contours of resist lines of submicrometer width as imaged by scanning electron microscopy, as a means of inspection in integrated circuit fabrication. The method is based on a modification of the Hough transform.

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Index Terms:
line extraction method; automated SEM inspection; VLSI resist; precision digital edge-line-detection method; edge contours; submicrometer width; scanning electron microscopy; integrated circuit fabrication; Hough transform; automatic testing; circuit analysis computing; computer vision; computerised picture processing; inspection; integrated circuit testing; scanning electron microscopy; transforms; VLSI
D.B. Shu, C.C. Li, J.F. Mancuso, Y.N. Sun, "A Line Extraction Method for Automated SEM Inspection of VLSI Resist," IEEE Transactions on Pattern Analysis and Machine Intelligence, vol. 10, no. 1, pp. 117-120, Jan. 1988, doi:10.1109/34.3875
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