The Community for Technology Leaders
RSS Icon
Subscribe
Issue No.01 - January (1988 vol.10)
pp: 117-120
ABSTRACT
<p>A precision digital edge-line-detection method is presented that was developed for extracting edge contours of resist lines of submicrometer width as imaged by scanning electron microscopy, as a means of inspection in integrated circuit fabrication. The method is based on a modification of the Hough transform.</p>
INDEX TERMS
line extraction method; automated SEM inspection; VLSI resist; precision digital edge-line-detection method; edge contours; submicrometer width; scanning electron microscopy; integrated circuit fabrication; Hough transform; automatic testing; circuit analysis computing; computer vision; computerised picture processing; inspection; integrated circuit testing; scanning electron microscopy; transforms; VLSI
CITATION
D.B. Shu, J.F. Mancuso, Y.N. Sun, "A Line Extraction Method for Automated SEM Inspection of VLSI Resist", IEEE Transactions on Pattern Analysis & Machine Intelligence, vol.10, no. 1, pp. 117-120, January 1988, doi:10.1109/34.3875
22 ms
(Ver 2.0)

Marketing Automation Platform Marketing Automation Tool