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2009 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems
Nanomechanical mass sensor for monitoring deposition rates through confined apertures
Shenzhen, China
January 05-January 08
ISBN: 978-1-4244-4629-2
| ASCII Text | x | ||
| Julien Arcamone, Marc Sansa, Jaume Verd, Arantxa Uranga, Gabriel Abadal, Nuria Barniol, Marc A.F. van den Boogaart, Juergen Brugger, Francesc Perez-Murano, "Nanomechanical mass sensor for monitoring deposition rates through confined apertures," International Conference on Nano/Micro Engineered and Molecular Systems, pp. 94-97, 2009 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, 2009. | |||
| BibTex | x | ||
| @article{ 10.1109/NEMS.2009.5068534, author = {Julien Arcamone and Marc Sansa and Jaume Verd and Arantxa Uranga and Gabriel Abadal and Nuria Barniol and Marc A.F. van den Boogaart and Juergen Brugger and Francesc Perez-Murano}, title = {Nanomechanical mass sensor for monitoring deposition rates through confined apertures}, journal ={International Conference on Nano/Micro Engineered and Molecular Systems}, volume = {0}, year = {2009}, isbn = {978-1-4244-4629-2}, pages = {94-97}, doi = {http://doi.ieeecomputersociety.org/10.1109/NEMS.2009.5068534}, publisher = {IEEE Computer Society}, address = {Los Alamitos, CA, USA}, } | |||
| RefWorks Procite/RefMan/Endnote | x | ||
| TY - CONF JO - International Conference on Nano/Micro Engineered and Molecular Systems TI - Nanomechanical mass sensor for monitoring deposition rates through confined apertures SN - 978-1-4244-4629-2 SP94 EP97 A1 - Julien Arcamone, A1 - Marc Sansa, A1 - Jaume Verd, A1 - Arantxa Uranga, A1 - Gabriel Abadal, A1 - Nuria Barniol, A1 - Marc A.F. van den Boogaart, A1 - Juergen Brugger, A1 - Francesc Perez-Murano, PY - 2009 VL - 0 JA - International Conference on Nano/Micro Engineered and Molecular Systems ER - | |||
A nanoelectromechanical mass sensor is used to characterize material deposition rates in stencil lithography. The material flux through micron size apertures is mapped with high spatial (below 1 µm) and deposition rate (below 10 µm/s) resolutions by displacing stencil apertures above the sensor. The sensor is based on a resonating metallic beam with submicron-size width and thickness. The beam is monolithically integrated with a CMOS readout and amplifier circuit to constitute a self-oscillator.
Citation:
Julien Arcamone, Marc Sansa, Jaume Verd, Arantxa Uranga, Gabriel Abadal, Nuria Barniol, Marc A.F. van den Boogaart, Juergen Brugger, Francesc Perez-Murano, "Nanomechanical mass sensor for monitoring deposition rates through confined apertures," nems, pp.94-97, 2009 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, 2009
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