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IEEE International Conference on Test, 2005.
Partnering with customer to achieve high yield
Austin, TX, USA
November 08-November 08
ISBN: 0-7803-9038-5
J. Wang, Taiwan Semicond. Manuf. Co., Hsinchu, OR, Taiwan
Even at increasing process challenge with nanometer technology at 90nm, TSMC is able to achieve much faster defect density improvement than previous generations of technologies. One of the main reasons for faster 90nm yield ramp is TSMC's Advanced Failure Analysis infrastructure that is being established over time and has become sophisticated and rigorous recently. More importantly, the strong partnership between TSMC and its customers makes the defect localization much more efficiently. And the strong partnership with customers is the key for the overall success of foundry business model.
Index Terms:
90 nm, nanometer technology, TSMC advanced failure analysis, defect localization, foundry business model, defect density improvement
Citation:
J. Wang, "Partnering with customer to achieve high yield," itc, pp.1 pp.-1315, IEEE International Conference on Test, 2005., 2005
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