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Microlithography: Trends, Challenges, Solutions, and Their Impact on Design
March/April 2003 (vol. 23 no. 2)
pp. 12-21
Alfred K. Wong, University of Hong Kong

With lithography parameters approaching their limits, continuous improvement requires increasing dialogues and compromises between the technology and design communities. Only with such communication can semiconductor manufacturers reach the 30-nm physical-gate-length era with optical lithography.

Citation:
Alfred K. Wong, "Microlithography: Trends, Challenges, Solutions, and Their Impact on Design," IEEE Micro, vol. 23, no. 2, pp. 12-21, March-April 2003, doi:10.1109/MM.2003.1196111
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