This Article 
   
 Share 
   
 Bibliographic References 
   
 Add to: 
 
Digg
Furl
Spurl
Blink
Simpy
Google
Del.icio.us
Y!MyWeb
 
 Search 
   
Intelligent Monitoring and Control of Semiconductor Manufacturing Equipment
December 1991 (vol. 6 no. 6)
pp. 19-31

The use of AI methods to monitor and control semiconductor fabrication in a state-of-the-art manufacturing environment called the Rapid Thermal Multiprocessor is described. Semiconductor fabrication involves many complex processing steps with limited opportunities to measure process and product properties. By applying additional process and product knowledge to that limited data, AI methods augment classical control methods by detecting abnormalities and trends, predicting failures, diagnosing, planning corrective action sequences, explaining diagnoses or predictions, and reacting to anomalous conditions that classical control systems typically would not correct. Research methodology and issues are discussed, and two diagnosis scenarios are examined.

Citation:
Janet L. Murdock, Barbara Hayes-Roth, "Intelligent Monitoring and Control of Semiconductor Manufacturing Equipment," IEEE Intelligent Systems, vol. 6, no. 6, pp. 19-31, Dec. 1991, doi:10.1109/64.108948
Usage of this product signifies your acceptance of the Terms of Use.