Issue No.01 - January/February (2001 vol.18)
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/54.902818
As circuit feature size continues to shrink, we will soon need a failure analysis technique that provides resolutions of 10 nanometers or less. This feasibility study concludes that AFM technology, with reasonable improvements, can take over where focused ion beams leave off.
Jien-Chung Lo, William D. Armitage, Corbet S. Johnson, "Using Atomic Force Microscopy for Deep-Submicron Failure Analysis", IEEE Design & Test of Computers, vol.18, no. 1, pp. 10-18, January/February 2001, doi:10.1109/54.902818