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Predictive Process Simulation and Stress-Mediated Diffusion in Silicon
July/August 2001 (vol. 3 no. 4)
pp. 92-95
Citation:
Wolfgang Windl, Matthew Laudon, Neil N. Carlson, Murray S. Daw, "Predictive Process Simulation and Stress-Mediated Diffusion in Silicon," Computing in Science and Engineering, vol. 3, no. 4, pp. 92-95, July-Aug. 2001, doi:10.1109/5992.931909
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